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发明人高志强,郑宇鹏,杨光. "A Process for Preparing High-Purity 2-Propenoic acid, 2-methyl-, polymer with ethenylbenzene, 2-ethylhexyl 2-propenoate and methyl 2-methyl-2-propenoate" [P]. 中国发明专利, 专利号 CN 108645245 B, 授权公告日 2024-01-09.
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