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发明人胡光,钱学锋,孙丽萍. "A Process for Preparing High-Purity 2-Butenoic acid, ethenyl ester, polymer with ethyl 2-propenoate and 2-methyl-2-propenoic acid" [P]. 中国发明专利, 专利号 CN 116294320 B, 授权公告日 2024-09-22.
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