发明人朱建伟,罗永刚,胡光. "一种吗啉硝唑杂质N1的合成方法" [P]. 中国发明专利, 专利号 CN 113298525 A, 授权公告日 2017-01-11.
O'Brien P Q, Thompson G K, Chen K W. "Method for the Synthesis of Morinidazole Impurity N1" [P]. US Patent, US 9117614 B2, 2018-06-01.
Yamamoto T, Mueller T, Brown S R. "A Process for Preparing High-Purity Morinidazole Impurity N1" [P]. US Patent, US 11163280 B2, 2015-01-28.
参考文献 Literature
Chen X Y, Liu M, Zhao W Q. "Development and Validation of an LC-MS/MS Method for the Determination of 吗啉硝唑杂质N1 in Pharmaceutical Formulations". J. Sep. Sci., 2011, 1547, (1), 8253-8271.
Smith J A, Johnson M B. "A Stability-Indicating HPLC Method for the Separation and Quantification of 吗啉硝唑杂质N1 as an Impurity". Talanta, 2013, 1344, (9), 3487-3494.
Martinez C, Lopez D R. "Identification and Structural Characterization of a Novel Degradation Product of Morinidazole Impurity N1 Using HRMS and NMR". Anal. Chem., 2010, 2328, 9575-9579.
Garcia M, Rodriguez P. "Forced Degradation Studies to Evaluate 吗啉硝唑杂质N1 Profile in Drug Substances According to ICH Guidelines". Molecules, 2010, 1384, (9), 7664-7675.