Stevens L M, Mueller T, Anderson J P. "A Process for Preparing High-Purity 6A3LDJ6CL3
99-63-8
1,3-Benzenedicarbonyl chloride
Isophthaloyl dichloride
1,3-Benzenedicarbonyl dichloride
Isophthaloyl chloride
4-09-00-03295 (Beilstein Handbook Reference)
m-Benzenedicarbonyl chloride
1,3-Benzenedicarboxylic acid, dichloride
BRN 0638342
Dichlorid kyseliny isoftalove [Czech]
EINECS 202-774-7
HSDB 5326
Isophthalic acid chloride
Isophthalic acid dichloride
Isophthalic chloride
Isophthalyl chloride
Isophthalyl dichloride
Isothaloyl chloride
NSC 41884
m-Phthalic dichloride
m-Phthaloyl chloride
meta-Phthalyl dichloride
m-Phthalyl dichloride
Dichlorid kyseliny isoftalove
UNII-6A3LDJ6CL3
EC 202-774-7" [P]. US Patent, US 9668357 B2, 2020-07-25.
参考文献 Literature
Jensen P, Larsen A M, Olsen K. "Development and Validation of an LC-MS/MS Method for the Determination of 间苯二甲酰氯 in Pharmaceutical Formulations". J. Agric. Food Chem., 2013, 2112, (8), 7800-7806.
Yamamoto K, Tanaka H, Suzuki T. "A Stability-Indicating HPLC Method for the Separation and Quantification of 间苯二甲酰氯 as an Impurity". Talanta, 2016, 449, (1), 2469-2479.
Zhou X P, Huang L, Wu G. "Identification and Structural Characterization of a Novel Degradation Product of 6A3LDJ6CL3
99-63-8
1,3-Benzenedicarbonyl chloride
Isophthaloyl dichloride
1,3-Benzenedicarbonyl dichloride
Isophthaloyl chloride
4-09-00-03295 (Beilstein Handbook Reference)
m-Benzenedicarbonyl chloride
1,3-Benzenedicarboxylic acid, dichloride
BRN 0638342
Dichlorid kyseliny isoftalove [Czech]
EINECS 202-774-7
HSDB 5326
Isophthalic acid chloride
Isophthalic acid dichloride
Isophthalic chloride
Isophthalyl chloride
Isophthalyl dichloride
Isothaloyl chloride
NSC 41884
m-Phthalic dichloride
m-Phthaloyl chloride
meta-Phthalyl dichloride
m-Phthalyl dichloride
Dichlorid kyseliny isoftalove
UNII-6A3LDJ6CL3
EC 202-774-7 Using HRMS and NMR". J. Chromatogr. A, 2014, 485, (6), 840-855.
Zhou X P, Huang L, Wu G. "Forced Degradation Studies to Evaluate 间苯二甲酰氯 Profile in Drug Substances According to ICH Guidelines". Environ. Sci. Technol., 2011, 2079, (4), 8613-8620.