发明人高志强,胡光,沈红梅. "一种瑞戈非尼杂质N2的合成方法" [P]. 中国发明专利, 专利号 CN 112157130 A, 授权公告日 2020-12-21.
发明人胡光,张德明,王建平. "Method for the Synthesis of Regorafenib Impurity N2" [P]. 中国发明专利, 专利号 CN 108330908 A, 授权公告日 2024-07-08.
参考文献 Literature
Kowalski T, Nowak Z. "Development and Validation of an LC-MS/MS Method for the Determination of 瑞戈非尼杂质N2 in Pharmaceutical Formulations". Phytochemistry, 2016, 2345, (9), 7909-7927.
Kumar A, Sharma P, Patel R S. "A Stability-Indicating HPLC Method for the Separation and Quantification of 瑞戈非尼杂质N2 as an Impurity". Chemosphere, 2017, 1564, (8), 2344-2374.
Martinez C, Lopez D R. "Identification and Structural Characterization of a Novel Degradation Product of Regorafenib Impurity N2 Using HRMS and NMR". Anal. Methods, 2014, 486, 1978-1982.
Wang L, Li J, Zhang H. "Forced Degradation Studies to Evaluate 瑞戈非尼杂质N2 Profile in Drug Substances According to ICH Guidelines". Anal. Chim. Acta, 2018, 2450, 8392-8404.