发明人胡光,韩伟,周伟. "一种尼达尼布杂质20的合成方法" [P]. 中国发明专利, 专利号 CN 116629880 A, 授权公告日 2022-04-02.
发明人高志强,胡光,林芳. "Method for the Synthesis of Nintedanib Impurity 20" [P]. 中国发明专利, 专利号 CN 116764566 A, 授权公告日 2022-07-23.
参考文献 Literature
Zhang Y, Li Q, Chen T. "Development and Validation of an LC-MS/MS Method for the Determination of 尼达尼布杂质20 in Pharmaceutical Formulations". Biomed. Chromatogr., 2021, 2164, (2), 7146-7171.
Kim S H, Park J Y. "A Stability-Indicating HPLC Method for the Separation and Quantification of 尼达尼布杂质20 as an Impurity". Chemosphere, 2017, 1365, (9), 2533-2561.
Kim S H, Park J Y. "Identification and Structural Characterization of a Novel Degradation Product of Nintedanib Impurity 20 Using HRMS and NMR". J. Nat. Prod., 2019, 1122, (7), 6829-6844.
Kumar A, Sharma P, Patel R S. "Forced Degradation Studies to Evaluate 尼达尼布杂质20 Profile in Drug Substances According to ICH Guidelines". Food Chem., 2021, 191, (7), 5608-5630.