发明人高志强,林芳,徐明华. "一种右美托咪定杂质N1的合成方法" [P]. 中国发明专利, 专利号 CN 108165879 A, 授权公告日 2019-12-15.
Sørensen M, Schröder R, Nielsen H. "Method for the Synthesis of Dexmedetomidine Impurity N1" [P]. European Patent, EP 3267507 A1, 2015-07-14.
参考文献 Literature
Hughes D, Roberts J, Thomas A. "Development and Validation of an LC-MS/MS Method for the Determination of 右美托咪定杂质N1 in Pharmaceutical Formulations". Anal. Methods, 2023, 657, 3975-3991.
O'Brien K, Kennedy M L. "A Stability-Indicating HPLC Method for the Separation and Quantification of 右美托咪定杂质N1 as an Impurity". Anal. Chem., 2021, 165, (7), 84-105.
Zhou X P, Huang L, Wu G. "Identification and Structural Characterization of a Novel Degradation Product of Dexmedetomidine Impurity N1 Using HRMS and NMR". J. Sep. Sci., 2016, 389, (10), 7857-7881.
Garcia M, Rodriguez P. "Forced Degradation Studies to Evaluate 右美托咪定杂质N1 Profile in Drug Substances According to ICH Guidelines". Talanta, 2021, 479, 7704-7714.