发明人钱学锋,王建平,赵玉洁. "一种奥格列龙杂质28的合成方法" [P]. 中国发明专利, 专利号 CN 109749411 A, 授权公告日 2016-08-21.
发明人杨光,郑宇鹏,徐明华. "Method for the Synthesis of Orforglipron impurity 28" [P]. 中国发明专利, 专利号 CN 114659770 B, 授权公告日 2018-02-16.
参考文献 Literature
Mueller T, Schmidt R K. "Development and Validation of an LC-MS/MS Method for the Determination of 奥格列龙杂质28 in Pharmaceutical Formulations". Environ. Sci. Technol., 2012, 1126, 3732-3738.
Kumar A, Sharma P, Patel R S. "A Stability-Indicating HPLC Method for the Separation and Quantification of 奥格列龙杂质28 as an Impurity". Rapid Commun. Mass Spectrom., 2016, 1346, (10), 6868-6875.
Brown R C, Davis S M. "Identification and Structural Characterization of a Novel Degradation Product of Orforglipron impurity 28 Using HRMS and NMR". J. Chromatogr. A, 2021, 1407, 8002-8005.
Fischer P, Wagner E. "Forced Degradation Studies to Evaluate 奥格列龙杂质28 Profile in Drug Substances According to ICH Guidelines". Anal. Methods, 2025, 369, 6790-6804.